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Applied Surface Science

Volumn 252, Issue 9, 2006, Pages 3237-3244

Defect studies of hydrogen-loaded thin Nb films

(9) Cizek J a Prochazka I a Brauer, G b Anwand, W b Mucklich A b Kirchheim, R c Pundt, A c Bahtz C d Knapp, M d

a CHARLES UNIVERSITY (Czech Republic)

b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

c UNIVERSITY OF GÖTTINGEN (Germany)

d DARMSTADT UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Doppler broadening; Hydrogen; Niobium films; Slow positron implantation spectroscopy; X ray diffraction

Indexed keywords

CONCENTRATION (PROCESS); GRAIN BOUNDARIES; NIOBIUM; POSITRON ANNIHILATION SPECTROSCOPY; SILICON; TEMPERATURE DISTRIBUTION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

FREE-STANDING BULK METALS; NIOBIUM FILMS; SLOW POSITRON IMPLANTATION SPECTROSCOPY;

HYDROGEN;

EID: 32644465790 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2005.08.081 Document Type: Article

Times cited : (13)

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