Multistage model of diffusion formation of inclusions of a suicide NiSi2 phase in film system of Ni [10 nm]/Si[Ni001];Multistage model of diffusion formation of inclusions of a suicide NiSi2 phase in film system of Ni [10 nm]/Si[Ni001]

Metallofizika i Noveishie Tekhnologii

Volumn 27, Issue 11, 2005, Pages 1529-1537

  Sidorenko, S I ^a   Voloshko, S M ^a   Makogon, Yu M ^a   Pavlova, O P ^a   Zamulko, S O ^a   Mogilatenko, A V ^a   Beddies, G ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

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EID: 32644435227     PISSN: 10241809     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

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