A study on reclaimed photoresist developer using an electrodialysis method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 4 B, 2002, Pages 2374-2379

  Sugawara, Hiroshi ^a   Tajima, Yoshinori ^b   Ohmi, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Japan Organo Co   (Japan)

Author keywords

Development; Electrodialysis; Photoresist developer; Purification; Reclamation; Tetramethylammonium hydroxide (TMAH)

Indexed keywords

ELECTRODIALYSIS; ION EXCHANGE; LIQUID CRYSTAL DISPLAYS; LITHOGRAPHY; LSI CIRCUITS; PURIFICATION;

ENVIRONMENTAL LOAD; PHOTORESIST DEVELOPER; TETRAMETHYLAMMONIUM HYDROXIDE (TMAH);

PHOTORESISTS;

EID: 32444441170     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.2374     Document Type: Article

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