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Applied Physics Letters

Volumn 57, Issue 23, 1990, Pages 2428-2430

Evidence for anomalous structural relaxation in SiO2 films

(2) Rendell, R W a Ngai, K L a

a NAVAL RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3242893179 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.103866 Document Type: Article

Times cited : (6)

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