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Applied Physics Letters

Volumn 42, Issue 5, 1983, Pages 416-418

Plasma parameter estimation from rf impedance measurements in a dry etching system

(1) Van Roosmalen, A J a

a PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3242871396 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.93948 Document Type: Article

Times cited : (51)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.