m-(p-tolylsulfonyloxy)aniline

Acta Crystallographica Section C: Crystal Structure Communications

Volumn 54, Issue 7, 1998, Pages 954-955

  Goswami, Shyamaprosad ^a   Mahapatra, Ajit Kumar ^b   Nigam, Gur Dayal ^b   Chinnakali, Kandasamy ^c,d   Razak, Ibrahim Abdul ^c   Fun, Hoong Kun ^c  

^a INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY   (India)

^c SCHOOL OF PHYSICS   (Malaysia)

^d ANNA UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3242862757     PISSN: 01082701     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0108270198001425     Document Type: Article

References (6)

1. Allen, F. H., Kennard, O., Watson, D. G., Brammer, L., Orpen, G. & Taylor, R. (1987). J. Chem. Soc. Perkin Trans. 2, pp. S1-S19.
2. Kurita, K. (1974). Chem. Ind. (London), p. 345.
3. Nardelli, M. (1995). J. Appl. Cryst. 28, 659.
4. Sheldrick, G. M. (1990). SHELXTL/PC Users Manual. Siemens Analytical X-ray Instruments Inc., Madison, Wisconsin, USA.
5. Sheldrick, G. M. (1993). SHELXL93 Program for the Refinement of Crystal Structures. University of Göttingen, Germany.
6. Siemens (1994). XSCANS Users Manual. Version 2.1. Siemens Analytical X-ray Instruments Inc., Madison, Wisconsin, USA.