UV light induced selective etching in borosilicate glasses for micropatterning

Electronics Letters

Volumn 32, Issue 5, 1996, Pages 451-452

  Kyung, J H ^a   Lawandy, N M ^a  

^a Brown University   (United States)

Author keywords

Borosilicate glasses; Etching

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; MASKS; PHOTOLITHOGRAPHY; POLISHING; SURFACE ROUGHNESS; SURFACE TREATMENT; ULTRAVIOLET LAMPS;

MICROPATTERNING; PHOTOINDUCED SELECTIVE ETCHING; POST ETCH POLISHING; SPIN AGITATED ETCHING; ULTRAVIOLET ARC LAMP;

BOROSILICATE GLASS;

EID: 3242847226     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19960298     Document Type: Article

References (3)

1. WOOLEY, A.T., and MATHIES, R.A.: Proc. Natl. Acad. Sci. USA, 1994, 91, p. 11348
2. KYUNG, J.H., and LAWANDY, N.M.: 'Maskless photo-encoded selective etching for glass based microtechnology applications', Opt. Lett., (submitted)
3. SAUVAIN, E., KYUNG, J.H., and LAWANDY, N.M.: 'Multiphoton micrometer-scale photoetching in silicate-based glasses', Opt. Lett., 1995, 20, p. 243