Electrostatic self assembly of monolayers of polyionic materials as observed by atomic force microscopy

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Volumn 37, Issue 2, 1996, Pages 608-609

  Bliznyuk, V N ^a   Visser, D W ^b   Tsukruk, V V ^b   Campbell, A L ^c   Bunning, T ^c   Adams, W W ^c  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

^b Western Michigan University   (United States)

^c AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CHEMISORPTION; ELECTRODEPOSITION; ELECTROSTATICS; MACROMOLECULES; MONOLAYERS; MONOMERS; MULTILAYERS; SILICON WAFERS; SURFACE ROUGHNESS;

POLYIONIC MATERIALS; POLYSTYRENE SULFONATE (PSS); SELF ASSEMBLED MONOLAYERS (SAM);

POLYSTYRENES;

EID: 3242819758     PISSN: 00323934     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)

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