Characterization of (112̄0) textured ZnO films fabricated by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 B, 2004, Pages 3004-3007

  Yanagitani, Takahiko ^a   Tomohiro, Shin Ichi ^a   Nohara, Takuya ^a   Matsukawa, Mami ^a   Watanabe, Yoshiaki ^a   Otani, Takahiko ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

(112 0) textured ZnO film; Brillouin scattering method; Pole figure analysis; RF magnetron sputtering; Shear wave transducer

Indexed keywords

BRILLOUIN SCATTERING; CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; SHEAR WAVES; TEXTURES; TRANSDUCERS; X RAY ANALYSIS;

(112̄0) TEXTURED ZNO FILM; BRILLOUIN SCATTERING METHOD; POLE FIGURE ANALYSIS; RF MAGNETRON SPUTTERING; SHEAR WAVE TRANSDUCER;

ZINC OXIDE;

EID: 3242776935     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3004     Document Type: Conference Paper

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