Effects of oxygen added to reagent gas on diamond thin film growth

New Diamond and Frontier Carbon Technology

Volumn 8, Issue 1, 1998, Pages 1-7

  Maki, Tetsuro ^a   Miyake, Hitoshi ^a   Sugahara, Kenichi ^a   Kobayashi, Takeshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Diamond thin films; Oxygen addition; Plasma impedance

Indexed keywords

EID: 3242760472     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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