Evaluation of adhesive strength of chemical vapor deposition diamond films by laser spallation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 B, 2004, Pages 3123-3126

  Ikeda, Ryuji ^a   Tasaka, Syun ^b   Cho, Hideo ^b   Takemoto, Mikio ^b  

^a Asahi Diamond Industrial Co Ltd   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

Adhesive strength; CVD diamond; Dipole source; Expansion wave; Laser spallatlon; Pulse laser

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CUTTING TOOLS; DIAMONDS; LASER PULSES; Q SWITCHED LASERS; SILICON CARBIDE; THICKNESS MEASUREMENT;

CVD DIAMOND; DIPOLE SOURCES; EXPANSION WAVE; LASER SPALLATION;

THIN FILMS;

EID: 3242753460     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3123     Document Type: Conference Paper

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