Effect of dopants on long afterglow properties of Y2O2S:Eu phosphor and its long afterglow mechanism

Wuji Cailiao Xuebao/Journal of Inorganic Materials

Volumn 19, Issue 3, 2004, Pages 523-528

  Yuan, Shuang Long ^a,b   Yang, Yun Xia ^a   Xu, Zhi Zhen ^a   Fang, Bin ^b  

^a UNIVERSITY OF SHANGHAI FOR SCIENCE AND TECHNOLOGY   (China)

^b EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Dopant; Long afterglow; Mechanism; Yttrium oxysulfide

Indexed keywords

DOPING (ADDITIVES); PHOTOLUMINESCENCE; YTTRIUM COMPOUNDS;

CODOPANTS; DOPANT EFFECT; LONG AFTERGLOW MECHANISM; LONG AFTERGLOW PROPERTIES; SINGLE ION DOPING; YTTRIUM OXYSULFIDE;

PHOSPHORS;

EID: 3242698684     PISSN: 1000324X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. NICHIA CORP. Red light-emitting afterglow photoluminescence phosphor and afterglow lamp using the phosphor. EP1111026, 2001.
2. Forest H, Cocco A, Hersh H. J. Lumin., 1970, 3 (not defined): 25-32.
3. Fonger W H, Struck C W. J. Electrochem. Soc., 1971, 118(2): 273-279.
4. Struck C W, Fonger W H. NATO Advanced Studies Institute, Series B: Physics, New York: Plenum Press, 1992. 301: 479-480.
5. Yoshinori M, Kiyotaka A, Keiji I. Kidorui, 2000, 36(1): 146-147.
6. Tseng Yun-Hwa, Chiou Bi-Shiou, Peng Chao-Chi, et al. Thin Solid Films, 1998, 330(2): 173-177.
7. Rajamohan Reddy K, Annapurna K, Buddhudu S. Mater. Res. Bull., 1996, 31(11): 1355-1359.
8. Kattaisamy M, Jagannathan R, Rao Ravi P, et al. J. Electrochem. Soc., 1995, 142(9): 3205-3209.
9. Matsuzawa T, Aoki Y, Takeuchi N, et al., J. Electrochem. Soc., 1996, 143(8): 2670-2673.
10. Struck C W, Fonger W H. Phys. Rev. B, 1971, 4 (1): 22-34.
11. Mikami M, Oshiyama A. Phys. Rev. B, 1999, 60(3): 1707-1715.
12. Mikami M, Oshiyama A. J. Lumin., 2000, 87-89 (not defined): 1206-1209.
13. Park S H, Mho S I. Solid State Comm., 1992, 83(1): 47-52.
14. Imanaga S, Yokono S Hoshina T. Japan. J. Appl. Phys., 1980, 19(1): 414-419.
15. Marvin J Weber, et al. Phosphor Handbook, The United State: CRC Press, 1999. 178-192.