Preparation of LaNiO3 thin films by mist plasma evaporation from aqueous precursor

Materials Chemistry and Physics

Volumn 87, Issue 1, 2004, Pages 134-137

  Huang, Hui ^a   Yao, Xi ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Electrical conductivity; Plasma deposition; Thin films

Indexed keywords

ANNEALING; DEPOSITION; ELECTRIC CONDUCTIVITY; EVAPORATION; PLASMAS; THIN FILMS;

ATOMIZING RATE; PLASMA DEPOSITION; PRECURSORS; SUBSTRATE TEMPERATURE;

LANTHANUM COMPOUNDS;

EID: 3242676922     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.05.017     Document Type: Article

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