Computer controlled chemical micro-reactor

Journal of Physics: Conference Series

Volumn 28, Issue 1, 2006, Pages 115-118

  Mechtilde, Schaefer ^a   Eduard, Stach ^a   Adreas, Foitzik ^b  

^a ESSLINGEN UNIVERSITY OF APPLIED SCIENCES   (Germany)

^b TECHNICAL UNIVERSITY OF APPLIED SCIENCES WILDAU   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 32144450839     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/28/1/024     Document Type: Article

References (3)

1. Schäfer M, Stach E, Lämmerzahl N, Leiprecht K, Foitzik A-H Rechnergesteuerte Dosierung eines Mikrochemiereaktors, 10. GMM / VDI/VDE-IT Workshop: Methoden und Werkzeuge für den Entwurf von Mikrosystemen, Cottbus, Okt. 20th - 22nd 2004 ISSN 0947 - 1413 S 345
2. Schäfer M, Starzmann R, Lehnert RJ, Ostertag E, Lämmerzahl N, vEiff H, Kessler RW, Foitzik AH Chemical Microreactors for non-Invasive Process Monitoring by Raman Spectroscopy Sensors and Systems, Int.. Conf., June 24th - 27th 2002, St. Petersburg, Russia
3. Loebbecke S, Schweikert W, Tuercke T, Antes J, Marioth E, Krause H Application of FTIR Microskopy for Process Monitoring in Silicon Microreactors, Micro.tec 2000, VDE World Microtechnologies Congress, Sept. 25th- 27th 2000, Expo 2000, Hannover, Germany