Etching mechanism of ferroelectric film etched by helicon plasma method

Integrated Ferroelectrics

Volumn 48, Issue , 2002, Pages 213-220

  You, In Kyu ^a   Yoon, Sung Min ^a   Cho, Seong Mok ^a   Kim, Kwi Dong ^a   Ryu, Sang Ouk ^a   Lee, Nam Yeal ^a   Yu, Byoung Gon ^a   Koo, Jin Gun ^a   Kim, Jong Dae ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Ferroelectric etching; Helicon wave; High density plasma; SBT

Indexed keywords

CHEMICAL REACTIONS; ETCHING; PLASMA APPLICATIONS; SECONDARY ION MASS SPECTROMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC ETCHING; HELICON WAVE; HIGH DENSITY PLASMA; SBT;

FERROELECTRIC THIN FILMS;

EID: 32044467991     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/713718328     Document Type: Article

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