Local structure of Ag nano-clusters deposited on silicon wafer by total conversion electron yield XAFS

Physica Scripta T

Volumn T115, Issue , 2005, Pages 459-461

  Suzuki, Y ^a   Miyanaga, T ^a   Kita, K ^a   Uruga, T ^b   Watanabe, I ^c  

^a HIROSAKI UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FILM THICKNESS; INFRARED SPECTROSCOPY; NANOCLUSTERS; THIN FILMS; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

CLUSTER PARTICLES; ELECTRIC FIELD INTENSITY; ELECTRON YIELD; LOCAL STRUCTURE;

SILICON WAFERS;

EID: 32044454811     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1238/Physica.Topical.115a00459     Document Type: Article

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