Surface Reactions of Co on SiO2 thin layer/Si substrate Studied by LEEM and PEEM

e-Journal of Surface Science and Nanotechnology

Volumn 4, Issue , 2006, Pages 155-160

  Maeda, Fumihiko ^a   Hibino, Hiroki ^a   Suzuki, Satoru ^a   Kobayashi, Yoshihiro ^a   Watanabe, Yoshio ^b,c   Guo, FangZhun ^c  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

^c JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

Cobalt; Low energy electron microscopy; Photoemission electron microscopy; Surface chemical reaction; X ray adsorption spectroscopy

Indexed keywords

COBALT; DIFFUSION; SILICA; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LOW ENERGY ELECTRON MICROSCOPY; PHOTOEMISSION ELECTRON MICROSCOPY; SURFACE CHEMICAL REACTION; X-RAY ADSORPTION SPECTROSCOPY;

SURFACE CHEMISTRY;

EID: 32044448527     PISSN: 13480391     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2006.155     Document Type: Conference Paper

References (6)

1. Y. Homma, Y. Kobayashi, T. Ogino, D. Takagi, R. Ito, Y. J. Jung, and P. M. Ajayan, J. Phys. Chem. B 107,12161 (2003).
2. F. Maeda, E. Laffosse, Y. Watanabe, S. Suzuki, Y. Homma, M. Suzuki, T. Kitada, T. Ogiwara, A. Tanaka, M. Kimura,V. A. Mihai, H. Yoshikawa, and S. Fukushima, Physica E 24, 19 (2004).
3. R. Tromp, G. W. Rubloff, P. Balk, and F. K. LeGoues, Phys. Rev. Lett. 55, 2332 (1985).
4. M. Liehr, J. E. Lewis, and G. W. Rubloff, J. Vac. Sci. Technol. A 5, 1559 (1987).
5. R. T. Tung, Appl. Phys. Lett. 68, 3461 (1996).
6. M. Y. Lee and B. A. Bennett, Phys. Rev. Lett. 75, 4460 (1995).