Analysis of the Williams-Hayfield model for oxidation kinetics

Journal of the Electrochemical Society

Volumn 153, Issue 3, 2006, Pages

  Fromhold Jr , A T ^a,b  

^a AUBURN UNIVERSITY   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH LAW; KELVIN TEMPERATURE; NUMERICAL COMPUTATIONS; UNIFORM DENSITY;

ELECTRIC CHARGE; GROWTH (MATERIALS); OXIDES; TEMPERATURE DISTRIBUTION; THERMOOXIDATION; THIN FILMS;

REACTION KINETICS;

EID: 32044447152     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2162472     Document Type: Article

References (15)

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