SCOPUS 정보 검색 플랫폼

Volumn PV 2005-09, Issue , 2005, Pages 457-464

Deposition and characterization of PECVD phosphorus-doped silicon oxynitride layers for integrated optics applications

(4) Hussein, M G a Worhoff K a Sengo, G a Driessen, A a

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DEPOSITION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTEGRATED OPTICS; PHOSPHORUS; REFRACTIVE INDEX; SILICON COMPOUNDS;

PHOSPHORUS CONCENTRATION; SILICON OXYNITRIDE LAYERS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 31744447988 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (2)

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