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Physical Review B

Volumn 33, Issue 10, 1986, Pages 7069-7076

Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

(3) Tsu, D V a Lucovsky, G a Mantini, M J a

a NORTH CAROLINA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 31744436718 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.33.7069 Document Type: Article

Times cited : (310)

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