The effect of precursors on the structure and conductivity of atomic layer deposited TiO2 films

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 575-582

  Jögi, Indrek ^a   Aarik, Jaan ^a   Kukli, Kaupo ^a   Käärabre, Henn ^a   Laan, Matti ^a   Lu, Jun ^b   Sajavaara, Timo ^c,d   Uustare, Teet ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b UPPSALA UNIVERSITY   (Sweden)

^c KU LEUVEN   (Belgium)

^d UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRODES; LEAKAGE CURRENTS; POLYCRYSTALLINE MATERIALS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION; CONDUCTIVITY MEASUREMENTS; POLYCRYSTALLINE ANATASE; TITANIA;

THIN FILMS;

EID: 31744436664     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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