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Volumn 92, Issue 9, 2005, Pages 539-552

Impact of interface traps on gate-induced drain leakage current in n-type metal oxide semiconductor field effect transistor

Author keywords

Band to band tunnelling; Band trap band; GIDL; Interface traps; Leakage current; MOSFET

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ELECTRON TUNNELING; HOT CARRIERS; INTEGRATED CIRCUITS; MOSFET DEVICES;

EID: 31744432455     PISSN: 00207217     EISSN: 13623060     Source Type: Journal    
DOI: 10.1080/00207210500092677     Document Type: Article
Times cited : (6)

References (63)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.