Influence of residual stresses and their relaxation on giant magnetoimpedance of CoFeSiB metallic glasses

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 A, 2005, Pages 4939-4944

  Saad, Andrea ^a,b   García, José Angel ^a   Kurlyandskaya, Galina ^a   Jesús Daniel, Santos ^a   Elbaile, Laura ^a  

^a UNIVERSITY OF OVIEDO   (Spain)

^b Niversidad de Buenos Aires   (Argentina)

Author keywords

Amorphous ribbon; Magnetic anisotropy; Magnetic sensor; Magnetoimpedance; Residual stresses

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ELECTRIC IMPEDANCE; HYSTERESIS; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS;

AMORPHOUS RIBBON; MAGNETIC SENSOR; MAGNETOIMPEDANCE;

RESIDUAL STRESSES;

EID: 31644451529     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.4939     Document Type: Article

References (26)

1. E. P. Harrison, G. L. Turney, H. Rowe and H. Gollop: CLVII Royal Soc. Proc. (1936) 451.
2. L. D. Landau, E. M. Lifshitz and L. P. Pitaevskii: Electrodynamics of Continuous Media (Butterworths-Heinemann, Washington, D.C., 1995) p. 210.
3. V. E. Makhotkin, B. P. Shurukhin, V. A. Lopatin, P. Yu. Marchukov and Yu. K. Levin: Sens. Actuators A 25-27 (1991) 759.
4. K. Bushida, M. Noda, L. V. Panina, H. Yoshida, T. Uchiyama and K. Morhi: J. Magn. Soc. Jpn. 18 (1994) 245.
5. R. S. Beach and A. E. Berkowitz: Appl. Phys. Lett. 64 (1994) 3652.
6. L. V. Panina, K. Mohri, K. Bushida and M. Noda: J. Appl. Phys. 76 (1994) 6198.
7. K. V. Rao, F. B. Humphrey and J. L. Costa-Krämer: J. Appl. Phys. 76 (1994) 6204.
8. S. lida, O. Ishi and S. Cambe: Jpn. J. Appl. Phys. 37 (1998) L869.
9. G. V. Kurlyandskaya, M. L. Sanchez, B. Hernando, V. M. Prida, P. Gorria and M. Tejedor: Appl. Phys. Lett. 82 (2003) 3053.
10. K. Mohri, T. Uchiyama, L. P. Shen, C. M. Cai and L. V. Panina: Sens. Actuators A 91 (2001) 85.
11. M. H. Phan, Y. S. Kim, N. X. Chien. S. C. Yu, H. Lee and N. Chau: Jpn. J. Appl. Phys. 42 (2003) 5571.
12. F. Amalou and M. A. M. Gijs: J. Appl. Phys. 95 (2004) 1364.
13. M. A. Cerdeira, G. V. Kurlyandskaya, A. Fernández, M. Tejedor and H. García-Miquel: Chin. Phys. Lett. 12 (2003) 2246.
14. V. M. Prida, P. Gorría, G. V. Kurlyandskaya, M. L. Sánchez, B. Hernando and M. Tejedor: Nanotechnology 14 (2003) 231.
15. C. Appino and F. Fiorillo: J. Appl. Phys. 76 (1994) 5731.
16. M. Vazquez, G. V. Kurlyandskaya, J. M. Garcia-Beneytez, J. M. Barandiaran, J. P. Sinnecker, V. A. Lukshina and A. P. Potapov: IEEE Trans. Magn. 35 (1999) 3358.
17. J. L. Muñoz, G. V. Kurlyandskaya, J. M. Barandiaran, A. P. Potapov, V. A. Lukshina and M. Vázquez: Phys. Met. Metall. 91 (2001) S129.
18. V. Franco and A. Conde: Mater. Lett. 49 (2001) 256.
19. S. S. Sikder and M. A. Asgar: Thermochim. Acta 326 (1999) 119.
20. G. V. Kurlyandskaya, J. M. Barandiaran, M. Vázquez, D. García and N. V. Dmitrieva: J. Magn. Magn. Mater. 215-216 (2000) 740.
21. M. Tejedor, J. A. Garcia, J. Carrizo and L. Elbaile: J. Mater. Sci. 32 (1997) 2337.
22. M. Tejedor, J. A. Garcia, J. Carrizo and L. Elbaile: J. Non-Cryst. Solids 235-237 (1998) 793.
23. Y. Nishibe, H. Yamadera, N. Ohta, K. Tsukada and Y. Nomomura: Sens. Actuators A 82 (2000) 155.
24. K.-Y. Ho, P. J. Flanders and C. D. Graham, Jr.: J. Appl. Phys. 53 (1982) 2279.
25. H. Liebermann: J. Appl. Phys. 61 (1987) 319.
26. D.-X. Chen, J. L. Muñoz, A. Hernando and M. Vázquez: Phys. Rev. B 57 (1998) 10699.