Focused ion beam-based fabrication of nanostructured photonic devices

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 11, Issue 6, 2005, Pages 1266-1276

  Cryan, Martin J ^a,b   Hill, M ^b   Sanz, D Cortaberria ^b   Ivanov, P S ^b   Heard, Peter J ^b   Tian, L ^b   Yu, Siyuan ^b   Rorison, Judy M ^b  

^a IEEE   (United Kingdom)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

Focused ion beam (FIB); Gratings; Photonic crystals (PhCs)

Indexed keywords

BAND EDGE POSITION; ELECTROMAGNETIC MODEL; PHOTONIC CRYSTALS (PHC); VERTICAL EMISSION;

CURRENT VOLTAGE CHARACTERISTICS; ETCHING; INDUCTIVELY COUPLED PLASMA; PHOTONS;

NANOSTRUCTURED MATERIALS;

EID: 31644443216     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2005.860990     Document Type: Article

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