Ultraviolet emission intensity, visible luminance, and electrical characteristics of small arrays of Al/Al 2O 3 microcavity plasma devices operating in Ar/N 2 or Ne at high-power loadings

Journal of Applied Physics

Volumn 99, Issue 2, 2006, Pages

  Park, S J ^a   Kim, K S ^a   Eden, J G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-POWER LOADINGS; MICROCAVITY PLASMA DEVICES; ULTRAVIOLET EMISSION; VOLTAGE WAVE FORM;

ALUMINUM FOIL; ARRAYS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; NANOSTRUCTURED MATERIALS; ULTRAVIOLET RADIATION;

PLASMA DEVICES;

EID: 31644441807     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2160709     Document Type: Article

References (5)

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2. S.-J. Park, K.-S. Kim, and J. G. Eden, Appl. Phys. Lett. 86, 221501 (2005).
3. Z. Xia, L. Riester, B. W. Sheldon, W. A. Curtin, J. Liang, A. Yin, and J. M. Xu, Rev. Adv. Mater. Sci. 6, 131 (2004).
4. M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.1636251 95, 846 (2004); M. J. Kushner, J. Phys. D 38, 1633 (2005).
5. M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.1636251 95, 846 (2004); M. J. Kushner, J. Phys. D 38, 1633 (2005).