Photosensitive LB film of PVA bearing p-phenylenediacrylate ester: Comparative study on properties of monomeric and polymeric film

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 322, Issue , 1998, Pages 129-134

  Nakanishi, F ^a   Gong, Y K ^b   Komatsu, T ^c   Abe, K ^a   Nagasawa, J ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

^b NORTHWEST UNIVERSITY   (China)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Contact angle; Langmuir Blodgett film; p phenylenediacrylic acid; Photoreactivity; PVA

Indexed keywords

EID: 31644439072     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587259808030211     Document Type: Article

References (9)

1. F. Nakanishi, Polym. Commun., 29, 325 (1988).
2. F. Nakanishi, H. Nakanishi, J. Photopolym. Sci. Technol., 3, 43 (1990).
3. F. Nakanishi, P. Fang, Y. Xu, J. Photopolym. Sci. Technol., 4, 65 (1991).
4. F. Nakanishi, H. Nakanishi, Mol. Cryst. Liq. Cryst., 253, 69 (1994).
5. J. Nagasawa, R. Bhatnagar, F. Nakanishi, J. Photopolym. Sci. Technol., 6, 139 (1993).
6. F. Nakanishi, S. Okada, H. Nakanishi, Polymer, 30, 1959 (1989).
7. K. Abe, S. Ohnishi, Jpn. J. Appl. Phys., 36, 6511 (1997).
8. L. M. Lander, L. M. Siewierski, W. J. Brittain, E. A. Vogler, Langmuir, 9, 2237 (1993).
9. A. W. Neumann, Adv. Colloid Interface Sci., 4, 105 (1974).