Ultrashallow profiling using secondary ion mass spectrometry: Estimating junction depth error using mathematical deconvolution

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 1, 2006, Pages 428-432

  Yang, Ming Hong ^a   Mount, Gary ^a   Mowat, Ian ^a  

^a CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC IMPLANTS; BEAM ION MIXING; JUNCTION DEPTH; MATHEMATICAL DECONVOLUTION;

CORRELATION METHODS; ERROR ANALYSIS; MATHEMATICAL MODELS; SEMICONDUCTOR JUNCTIONS;

SECONDARY ION MASS SPECTROMETRY;

EID: 31544439161     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2132319     Document Type: Article

References (11)

1. W. Vandervorst et al., Appl. Surf. Sci. 231-232, 618 (2004).
2. S. Miwa, Appl. Surf. Sci. 231-232, 658 (2004).
3. C. Hongo, M. Tomita, and M. Takenaka, Appl. Surf. Sci. 231-232, 673 (2004).
4. M. H. Yang and R. Odom, Mater. Res. Soc. Symp. Proc. 669, J4.16.1 (2001).
5. B. V. King and I. S. T. Tsong, Nucl. Instrum. Methods Phys. Res. B 7/8, 793 (1985).
6. D. P. Chu and M. G. Dowsett, Phys. Rev. B 56, 15167 (1997).
7. B. Gautier et al., Surf. Interface Anal. 24, 733 (1996).
8. J. B. Clegg, Surf. Interface Anal. 10, 332 (1987).
9. M. G. Dowsett, in Secondary Mass Spectrometry SIMS X, edited by, A. Benninghoven et al., (1995), p. 355.
10. K. Wittmaack, Appl. Surf. Sci. 203-204, 268 (2003).
11. Y. Kataoka, K. Yamazaki, M. Shigeno, Y. Tada, and K. Wittmaack, Appl. Surf. Sci. 203-204, 43 (2003).