Modelling of the energetics and kinetics of Al deposition on 5-fold Al-rich quasicrystal surfaces

Philosophical Magazine

Volumn 86, Issue 6-8, 2006, Pages 831-840

  Ghosh, C ^a   Liu, D J ^a   Jenks, C J ^a   Thiel, P A ^a   Evans, J W ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; POTENTIAL ENERGY; QUASICRYSTALS; REACTION KINETICS; SINGLE CRYSTALS; SUBSTRATES; SURFACE CHEMISTRY;

AL ADATOMS; MODELING;

ALUMINUM;

EID: 31444450702     PISSN: 14786435     EISSN: 14606992     Source Type: Journal    
DOI: 10.1080/14786430500334750     Document Type: Review

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