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Volumn 52, Issue 16, 2005, Pages 2303-2308

GaAs/AlGaAs quantum cascade lasers with dry etched semiconductor-air Bragg reflectors

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ASPECT RATIO; ETCHING; MIRRORS; SEMICONDUCTING GALLIUM ARSENIDE;

EID: 31444450385     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340500275462     Document Type: Conference Paper
Times cited : (11)

References (9)
  • 8
    • 17944376974 scopus 로고    scopus 로고
    • High aspect ratio etching with SiCl4 plasma for THz Photonic Crystals in GaAs
    • Smolenice, Slovakia
    • S. Golka, W. Schrenk, G. Strasser, High aspect ratio etching with SiCl4 plasma for THz Photonic Crystals in GaAs, Proc. WOCSDICE 28, Smolenice, Slovakia (2004), p. 127.
    • (2004) Proc. WOCSDICE , vol.28 , pp. 127
    • Golka, S.1    Schrenk, W.2    Strasser, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.