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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 6 A, 1998, Pages 3508-3513

Effect of substrate potential on plasma parameters of magnetic multicusp plasma source

(4) Ueda, Yoshio a Ito, Masahiro a Yoshikawa, Takafumi a Goto, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Arc discharge; Electron energy distribution function; Ion impact energy; Magnetic multicusp plasma source; Single probe; Substrate potential

Indexed keywords

EID: 3142775090 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.3508 Document Type: Article

Times cited : (1)

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