Laser induced photoresist thin film removal from silicon wafer surface

Journal of Optoelectronics and Advanced Materials

Volumn 6, Issue 2, 2004, Pages 481-484

  Apostol, I ^a   Damian, V ^a   Timcu, A ^a   Iordache, I ^a   Bianco, M ^a,b   Galli, R ^a,b   Castex, M C ^a,c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b Rtm   (Italy)

^c UNIVERSITÉ PARIS 13   (France)

Author keywords

Laser induced cleaning; Photoresist; Silicon wafer

Indexed keywords

ABSORPTION; LASER BEAM EFFECTS; MICROELECTRONICS; PULSED LASER DEPOSITION; REMOVAL; SILICON WAFERS; THIN FILMS; ULTRAVIOLET RADIATION;

LASER INDUCED CLEANING; MIRROR QUALITY SURFACE;

PHOTORESISTS;

EID: 3142774924     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. J. M. Poate, James W. Mayer: Laser Annealing of Semiconductors (Academic Press, New York, London 1982).
2. I. Apostol, D. Ulieru, R. Dabu, C. Ungureanu, L. Rusen: SPIE Proc. 4762, 235 (2001).
3. B. S. Luk'yanchuk: Laser cleaning (Editor) World Scientific, Singapore, 2002.