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Volumn 10, Issue 3, 2004, Pages 124-
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Erratum: Growth per cycle in atomic layer deposition: A theoretical model (Chemical Vapor Deposition (2003) 9 (249))
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 3142758736
PISSN: 09481907
EISSN: None
Source Type: Journal
DOI: 10.1002/cvde.200490008 Document Type: Erratum |
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Times cited : (3)
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References (0)
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