Facile method for the preparation of triarylsulfonium bromides using Grignard reagents and chlorotrimethylsilane as an activator

Synthesis

Volumn , Issue 10, 2004, Pages 1648-1654

  Imazeki, Shigeaki ^a   Sumino, Motoshige ^a   Fukasawa, Kazuhito ^a   Ishihara, Masami ^a   Akiyama, Takahiko ^b  

^a FUJIFILM Wako Pure Chemical Corporation   (Japan)

^b GAKUSHUIN UNIVERSITY   (Japan)

Author keywords

Coupling; Grignard reaction; Photo acid generator; Silicon; Sulfoxide

Indexed keywords

SILANES; SOLUTIONS; SUBSTITUTION REACTIONS; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL);

GRIGNARD REAGENTS; TRIARYLSULFONIUM BROMIDES;

BROMINE COMPOUNDS;

BROMINE DERIVATIVE; CHLOROTRIMETHYLSILANE; DIMETHYL SULFITE; HYDROBROMIC ACID; SULFONIUM DERIVATIVE; SULFUR; SULFUR DERIVATIVE; THIONYL CHLORIDE; UNCLASSIFIED DRUG;

AQUEOUS SOLUTION; ARTICLE; GRIGNARD REACTION; SYNTHESIS;

EID: 3142726368     PISSN: 00397881     EISSN: None     Source Type: Journal    
DOI: 10.1055/s-2004-829113     Document Type: Article

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20. Refer to: (a) Oono, K.; Fukasawa, K.; Sakamoto, K.; Urano, F.; Sumino, M.; Imazeki, S. Chem. Abstr. 2001, 135, 76685. (b) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Takano, N.; Imazeki, S. Chem. Abstr. 2002, 136, 217191. (c) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Imazeki, S.; Sakuma, Y. Chem. Abstr. 2002, 137, 392177. (d) Ishihara, M.; Sumino, M.; Fukasawa, K.; Sakuma, Y. Chem. Abstr. 2002, 137, 302235.
21. Refer to: (a) Oono, K.; Fukasawa, K.; Sakamoto, K.; Urano, F.; Sumino, M.; Imazeki, S. Chem. Abstr. 2001, 135, 76685. (b) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Takano, N.; Imazeki, S. Chem. Abstr. 2002, 136, 217191. (c) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Imazeki, S.; Sakuma, Y. Chem. Abstr. 2002, 137, 392177. (d) Ishihara, M.; Sumino, M.; Fukasawa, K.; Sakuma, Y. Chem. Abstr. 2002, 137, 302235.
22. Refer to: (a) Oono, K.; Fukasawa, K.; Sakamoto, K.; Urano, F.; Sumino, M.; Imazeki, S. Chem. Abstr. 2001, 135, 76685. (b) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Takano, N.; Imazeki, S. Chem. Abstr. 2002, 136, 217191. (c) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Imazeki, S.; Sakuma, Y. Chem. Abstr. 2002, 137, 392177. (d) Ishihara, M.; Sumino, M.; Fukasawa, K.; Sakuma, Y. Chem. Abstr. 2002, 137, 302235.
23. Refer to: (a) Oono, K.; Fukasawa, K.; Sakamoto, K.; Urano, F.; Sumino, M.; Imazeki, S. Chem. Abstr. 2001, 135, 76685. (b) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Takano, N.; Imazeki, S. Chem. Abstr. 2002, 136, 217191. (c) Ishihara, M.; Sumino, M.; Fukasawa, K.; Maesawa, T.; Imazeki, S.; Sakuma, Y. Chem. Abstr. 2002, 137, 392177. (d) Ishihara, M.; Sumino, M.; Fukasawa, K.; Sakuma, Y. Chem. Abstr. 2002, 137, 302235.