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Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 885-894

Secondary electron emission yield on poled silica based thick films

(6) Braga, D a Poumellec, B b Cannas, V b Blaise, G a Ren, Y c Kristensen, M c

a UNIVERSITÉ PARIS SUD (France)

b UNIVERSITÉ PARIS SUD (France)

c TECHNICAL UNIVERSITY OF DENMARK (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CHEMICAL ANALYSIS; CURRENT DENSITY; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRONS; PERTURBATION TECHNIQUES; PHOTORESISTORS; SCANNING ELECTRON MICROSCOPY; SEPARATION; SILICA;

CHARGE DENSITY; ELECTRON BEAM BLANKING UNIT (EBBU); ELECTRON BEAM ENERGY; ELECTRON INJECTION;

THICK FILMS;

EID: 3142698776 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1758315 Document Type: Article

Times cited : (16)

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