SCOPUS 정보 검색 플랫폼

Volumn 261-263, Issue II, 2004, Pages 1599-1604

Influence of the surface topography on the micromechanical properties and performance of a CMP finished AIN component for silicon plasma etching

(4) Chouanine, L a Takano, M a Ashihara, F a Kamiya, O a

a AKITA UNIVERSITY (Japan)

Author keywords

AIN; CMP; Localized nanoindentation; Micro nanotribology; Seliconductor processing components; Surface damage; Surface topography

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; CHEMICAL VAPOR DEPOSITION; DURABILITY; IN SITU PROCESSING; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SLURRIES; SURFACE PHENOMENA; SURFACE TOPOGRAPHY; TRIBOLOGY; VISCOELASTICITY; YTTRIUM;

AIN; CMP; LOCALIZED NANOINDENTATION; MICRO/NANOTRIBOLOGY; SELICONDUCTOR PROCESSING COMPONENTS; SURFACE DAMAGE;

MATERIALS SCIENCE;

EID: 3142680851 PISSN: 10139826 EISSN: 16629795 Source Type: Book Series
DOI: None Document Type: Conference Paper

Times cited : (7)

References (10)

1
- 0003779543
- The Society of Photo-Optical Instrumentation Engineers, Washington
- P.R. Choudhury, Handbook of Microlithography, Micromachining, and Microfabrication, The Society of Photo-Optical Instrumentation Engineers, Washington, Vol. 1-2 (1997).
- (1997) Handbook of Microlithography, Micromachining, and Microfabrication , vol.1-2
- Choudhury, P.R.¹

2
- 0003647688
- Marcel Dekker, New York
- D. W. Richerdson, Modern Ceramic Engineering: Properties, Processing, and Use in Design, 2nd ed.; Marcel Dekker, New York (1992) p. 374.
- (1992) Modern Ceramic Engineering: Properties, Processing, and Use in Design, 2nd Ed. , pp. 374
- Richerdson, D.W.¹

3
- 3142662962
- T. Abraham, and W. Davidson, GB-163 Near Net Shape Manufacturing of Advanced Ceramics, (1995) p. 64.
- (1995) GB-163 Near Net Shape Manufacturing of Advanced Ceramics , pp. 64
- Abraham, T.¹ Davidson, W.²

4
- 3142706998
- N. X. Randall, R. Chrisoph, S. Droz and C. J. Schmutz, Thin Solid Films; 348, 291-290 (1996).
- (1996) Thin Solid Films , vol.348 , pp. 291-1290
- Randall, N.X.¹ Chrisoph, R.² Droz, S.³ Schmutz, C.J.⁴

5
- 0035414786
- L. Chouanine, Optical Eng. 40 (8) (2001) p. 1709.
- (2001) Optical Eng. , vol.40 , Issue.8 , pp. 1709
- Chouanine, L.¹

6
- 0003508875
- John Wiley & Sons, New York
- J. M. Steigerwald, S. P. Murarka, and R. J. Gutmann, Chemical Mechanical Planarization of Microelectronic Materials, John Wiley & Sons, New York (1997) p. 269.
- (1997) Chemical Mechanical Planarization of Microelectronic Materials , pp. 269
- Steigerwald, J.M.¹ Murarka, S.P.² Gutmann, R.J.³

7
- 4344699572
- J. C. Lambropoulos, S. D. Jacobs, B. Gillman, F. Yang, and J. Ruckman, 5th Inter. Conf. Adv ances in the Fusion and Processing of Glass, 82 (1998) p. 469.
- (1998) 5th Inter. Conf. Adv Ances in the Fusion and Processing of Glass , vol.82 , pp. 469
- Lambropoulos, J.C.¹ Jacobs, S.D.² Gillman, B.³ Yang, F.⁴ Ruckman, J.⁵

8
- 38849172628
- W. I. Kordonski and S. D. Jacobs, 6th Inter. Conf. Adaptive Structures, Lancaster, (1996) p. 63.
- (1996) 6th Inter. Conf. Adaptive Structures, Lancaster , pp. 63
- Kordonski, W.I.¹ Jacobs, S.D.²

9
- 0026875935
- W. C. Oliver, and G. M Pharr, J. Mater. Res., 7 (1992) p. 1564.
- (1992) J. Mater. Res. , vol.7 , pp. 1564
- Oliver, W.C.¹ Pharr, G.M.²

10
- 0002892538
- U.S. Patent No.4, 848, 14
- W. C. Oliver and J. B. Pethica, Method for continuous of the elastic stiffness of contact between two bodies, U.S. Patent No.4, 848, 14 (1989).
- (1989) Method for Continuous of the Elastic Stiffness of Contact between Two Bodies
- Oliver, W.C.¹ Pethica, J.B.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.