Application of advanced phase-shift masks

Semiconductor International

Volumn 26, Issue 10, 2003, Pages 69-72

  Maurer, Wilhelm ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMELESS PHASE LITHOGRAPHY (CPL); CHROMEON-GLASS (COG); PHASE-SHIFT MASKS (PSM);

CHROMIUM; COST EFFECTIVENESS; ETCHING; OPTIMIZATION; PHASE SHIFT; PROCESS CONTROL; X RAY LITHOGRAPHY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 3142596652     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (2)

1. D. Van Den Broeke, et al., "Complex 2D Pattern Lithography at λ/4 Resolution Using Chromeless Phase Lithography (CPL)," Proc. SPIE 4691, p. 196 (2002).
2. A. Torres and W. Maurer. "Alternatives to Alternating Phase Shift Masks for 65nm," Proc SPIE 4889, p. 540 (2002).