Critical role of surface steps in the alloying of Ge on Si(001)

Physical Review Letters

Volumn 92, Issue 21, 2004, Pages

  Hannon, J B ^a   Copel, M ^a   Stumpf, R ^b   Reuter, M C ^a   Tromp, R M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYING; ATOMIC FORCE MICROSCOPY; BINDING ENERGY; DIMERS; ENTROPY; NUCLEATION; SILICON; SILICON COMPOUNDS; STRUCTURAL ANALYSIS; WAKES;

DIFFRACTION PATTERNS; INTERMIXING; SURFACE LAYERS; SURFACE STEPS;

GERMANIUM;

EID: 3142556201     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.92.216104     Document Type: Article

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