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Volumn 39, Issue 1, 1998, Pages 532-533
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Microlithographic applications of silicon-containing polymers and individual organosilicon compounds
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Author keywords
[No Author keywords available]
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Indexed keywords
COPOLYMERS;
CROSSLINKING;
PHOTORESISTS;
PLASMA ETCHING;
POLYSTYRENES;
REACTIVE ION ETCHING;
TOP SURFACE IMAGING PROCESS;
SILICONES;
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EID: 3142521889
PISSN: 00323934
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (2)
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References (11)
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