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Volumn 39, Issue 1, 1998, Pages 532-533

Microlithographic applications of silicon-containing polymers and individual organosilicon compounds

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; CROSSLINKING; PHOTORESISTS; PLASMA ETCHING; POLYSTYRENES; REACTIVE ION ETCHING;

EID: 3142521889     PISSN: 00323934     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article
Times cited : (2)

References (11)
  • 5
    • 0011414853 scopus 로고    scopus 로고
    • J.C. Salamone Ed.-in-Chief, CRC Press
    • E.D. Babich in: "Polymeric Materials Encyclopedia", J.C. Salamone Ed.-in-Chief, vol.10, pp 7621-7635, CRC Press (1996).
    • (1996) Polymeric Materials Encyclopedia , vol.10 , pp. 7621-7635
    • Babich, E.D.1
  • 8
    • 3142643118 scopus 로고    scopus 로고
    • US Patent 5,098,816 (1992)
    • US Patent 5,098,816 (1992);
  • 9
    • 3142577208 scopus 로고    scopus 로고
    • US Patent 5,048,816 (1992)
    • US Patent 5,048,816 (1992);
  • 10
    • 3142647315 scopus 로고    scopus 로고
    • US Patent 5,229,251 (1993)
    • US Patent 5,229,251 (1993);


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.