On the physical quality of copper electrodeposits obtained on mesh cathodes

Canadian Metallurgical Quarterly

Volumn 45, Issue 1, 2006, Pages 9-16

  Cifuentes, L ^a   Mella, M ^a  

^a UNIVERSITY OF CHILE   (Chile)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CURRENT DENSITY; ELECTRODEPOSITION; ELECTROLYTES; SULFURIC ACID; THERMAL EFFECTS;

CATHOLYTES; COPPER ELECTRODEPOSITS; COPPER MESH CATHODES; RECIRCULATION FLOW RATE;

COPPER;

EID: 31344477044     PISSN: 00084433     EISSN: None     Source Type: Journal    
DOI: 10.1179/cmq.2006.45.1.9     Document Type: Article

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