SCOPUS 정보 검색 플랫폼

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 67, Issue 7, 2001, Pages 1159-1163

A study on electrochemical machining method in ultrapure water - First-principles molecular-dynamics simulations for etching process of hydrogen-terminated Si(001) surface by hydroxyl ions

(5) Mori, Yuzo a Goto, Hidekazu a Hirose, Kikuzi a Kobata, Itsuki a Toma, Yasushi a

a NONE

Author keywords

Back bond; Density functional theory; Electrochemical machining in ultrapure water; Etching; First principles molecular dynamics simulation; Hydrogen terminated silicon (001) surface; Hydroxyl ion; Plane wave basis set; Pseudopotential; Surface step

Indexed keywords

EID: 31344470782 PISSN: 09120289 EISSN: None Source Type: Journal
DOI: 10.2493/jjspe.67.1159 Document Type: Article

Times cited : (2)

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