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Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

Volumn 67, Issue 7, 2001, Pages 1169-1174

A study on electrochemical machining method in ultrapure water - Etching process of hydrogen-terminated Si(001) surface atom by hydroxyl function

(5) Goto, Hidekazu a Hirose, Kikuzi a Kobata, Itsuki a Toma, Yasushi a Mori, Yuzo a

a NONE

Author keywords

Back bond; Density functional theory; Etching; First principles molecular dynamics simulation; Hydrogen terminated silicon (001) surface; Hydroxyl radical; Orbital hybridization; Plane wave basis set; Pseudopotential; Surface step

Indexed keywords

EID: 31344446267 PISSN: 09120289 EISSN: None Source Type: Journal
DOI: 10.2493/jjspe.67.1169 Document Type: Article

Times cited : (1)

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