Process method to suppress the effect of phase errors in alternating phase shift masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 540-546

  Singh, Navab ^a,b   Roy, Moitreyee M ^a   Mehta, Sohan S ^a   Adeyeye, A O ^b  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; LENSES; PHASE COMPOSITION;

ASTIGMATISM; PHASE SHIFT MASKS;

PHASE SHIFT;

EID: 31144471023     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1885012     Document Type: Conference Paper

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