Multilayer approach to the quantitative analysis of x-ray photoelectron spectroscopy results: Applications to ultrathin SiO2 on Si and to self-assembled monolayers on gold

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1456-1470

  Van Der Marel, C ^a   Yildirim, M ^a   Stapert, H R ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; GATES (TRANSISTOR); GOLD; MONOLAYERS; MULTILAYERS; SEMICONDUCTING GALLIUM ARSENIDE; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL CHARACTERIZATION; CHEMICAL STATES; SURFACE LAYERS;

ULTRATHIN FILMS;

EID: 31144452703     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2008274     Document Type: Article

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