Composition spread metal thin film fabrication technique based on ion beam sputter deposition

Applied Surface Science

Volumn 252, Issue 7, 2006, Pages 2472-2476

  Ahmet, P ^a   Nagata, T ^a   Kukuruznyak, D ^a   Yagyu, S ^a   Wakayama, Y ^a   Yoshitake, M ^a   Chikyow, T ^a,b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Composition spread; Ion beam; Metal gate; Metal thin film

Indexed keywords

DIELECTRIC FILMS; ELECTRODES; ION BEAM ASSISTED DEPOSITION; SUBSTRATES; TERNARY SYSTEMS;

COMPOSITION SPREAD; METAL GATE; METAL THIN FILMS;

THIN FILMS;

EID: 31144437828     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.05.078     Document Type: Conference Paper

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