Inductively coupled plasma etching of poly-SiC in SF 6 chemistries

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 947-952

  Kuah, S H ^a   Wood, P C ^a  

^a 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHED SURFACE; GAS MIXTURES; SULFUR HEXAFLUORIDE (SF6);

BYPRODUCTS; DISSOCIATION; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING; POLYSILICON; SULFUR COMPOUNDS;

SILICON CARBIDE;

EID: 31044451514     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1913682     Document Type: Conference Paper

References (6)

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