Cu spin cleaning evaluation by SOR X-ray fluorescence analysis

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 217-220

  Hayashi, Hidekazu ^a   Tsugane, Ken ^b   Kagoshima, Yasushi ^c   Koyama, Takahisa ^c   Watanabe, Masaharu ^a   Kozuki, Yasushi ^a  

^a SEZ Japan Inc   (Japan)

^b HITACHI LTD   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

Copper; Single Wafer Cleaning; SOR; X ray fluorescence

Indexed keywords

COPPER; ENERGY DISPERSIVE X RAY ANALYSIS; FLUORESCENCE; SILICON WAFERS; X RAY DIFFRACTION ANALYSIS; X RAYS;

CLEANING EFFICIENCY; CONTAMINATION CONTROL; CONVENTIONAL METHODS; EFFECTIVE REMOVALS; MANUFACTURING LINES; SINGLE-WAFER CLEANING; X RAY FLUORESCENCE; X RAY FLUORESCENCE ANALYSIS;

CLEANING;

EID: 31044442721     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.217     Document Type: Conference Paper

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