Airborne molecular contamination: A roadmap for the 0.25 μm generation

Semiconductor International

Volumn 19, Issue 6, 1996, Pages 231-238

  Kinkead, Devon ^a  

^a Extraction Systems Inc   (United States)

Author keywords

0.25 m processing; Airborne molecular contamination; Contamination control

Indexed keywords

EID: 30844472197     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. F.A. Stevie et al., "Boron Contamination of Surfaces in Silicon Microelectronics Processing: Characteristics and Ccauses," Journal of Vacuum Science and Technology A, 1991. 9(5): p. 2813.
2. M. Inoue et al., "Study on Boron Contamination in Clean Room," 12th International Symposium on Contamination Control, 1994, Yokohama, Japan: The International Confederation of Contamination Control Societies (ICCCS).