Photolithography process modeling using neural networks

Semiconductor International

Volumn 19, Issue 6, 1996, Pages 199-206

  Cardarelli, G ^a   Palumbo, M ^a   Pelagagge, P M ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Neural networks; Photolithography; UV exposure energy

Indexed keywords

EID: 30844457253     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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