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Volumn 237-240, Issue PART 1, 2005, Pages 468-473

Chemical diffusion in TiO2

Author keywords

Chemical diffusion; Defect structure; Electrical conductivity; Rutile; Titanium dioxide

Indexed keywords

DIFFUSION; ELECTRIC CONDUCTIVITY; OXYGEN;

EID: 30844456224     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.237-240.468     Document Type: Conference Paper
Times cited : (1)

References (14)
  • 4
    • 1842470272 scopus 로고
    • The formation and ordering of shear planes in non-stoichiometric oxides, Chemical physics of solids and their surfaces
    • London, UK
    • C.R.A.Catlow and R.James:The formation and ordering of shear planes in non-stoichiometric oxides, Chemical physics of solids and their surfaces, 8, Royal Soc. Chem. (1980), p.108-120. London, UK
    • (1980) Royal Soc. Chem. , vol.8 , pp. 108-120
    • Catlow, C.R.A.1    James, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.