Fabrication of Co2MnAl heusler alloy epitaxial film using Cr buffer layer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 9 A, 2005, Pages 6535-6537

  Sakuraba, Yuya ^a   Nakata, Jun ^a   Oogane, Mikihiko ^a   Kubota, Hitoshi ^b   Ando, Yasuo ^a   Sakuma, Akimasa ^a   Miyazaki, Terunobu ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Epitaxial film; Half metal; Heusler alloy; Magnetic tunnel junction

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHROMIUM; EPITAXIAL GROWTH; MAGNETRON SPUTTERING; MANGANESE COMPOUNDS; TEMPERATURE DISTRIBUTION; THIN FILMS; TUNNEL JUNCTIONS; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL FILM; HALF-METAL; HEUSLER ALLOY;

COBALT ALLOYS;

EID: 30744463890     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.6535     Document Type: Article

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